Kinetic smoothing and roughening of a step with surface diffusion.
Kinetic smoothing and roughening of a step with surface diffusion.
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通过表面扩散对台阶进行动力学平滑和粗糙化。
DOI：
10.1103/physrevlett.68.224
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发表时间：
1992
影响因子：
8.6
通讯作者：
Yukio Saito
中科院分区：
文献类型：
--
作者：
M. Uwaha;Yukio Saito
用线性随机理论研究了气相生长条件下晶体台阶的涨落，其中吸附原子的表面扩散是必不可少的。在台阶动力学不对称的情况下，台阶在后退时变得光滑，而当台阶在Mullins-Sekerka失稳点附近生长时变得非常粗糙。蒙特卡罗模拟证实了这些影响
Fluctuation of a step of a crystal in the vapor growth condition, where surface diffusion of adsorbed atoms is essential, is studied with a linear stochastic theory. With an asymmetry in step kinetics, the step becomes smooth when it recedes, whereas it becomes very rough when it grows near the Mullins-Sekerka instability point. These effects are confirmed by Monte Carlo simulations