HCOO − aq degradation in droplets by OH aq in an atmospheric pressure glow discharge
HCOO − aq degradation in droplets by OH aq in an atmospheric pressure glow discharge
复制标题
HCOO → OH aq 在大气压辉光放电中对液滴的降解
DOI：
10.1088/1361-6463/acc958
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发表时间：
2023
期刊：
影响因子：
--
通讯作者：
Kushner, Mark J.
中科院分区：
文献类型：
--
作者：
Meyer, Mackenzie;Nayak, Gaurav;Bruggeman, Peter J.;Kushner, Mark J.
等离子体与液体接触可以降解溶液中的有机分子，在等离子体中产生的活性氧和活性氮溶化到液体中。与处理体积比较小的大体积液体相比，在等离子体中浸泡小液滴（直径几十微米）可以更快地激活液体。利用零维等离子体化学模型，研究了He/ h2o中持续的射频辉光放电与浸入等离子体并流经等离子体的含有甲酸盐（HCOO - aq）的水滴之间的相互作用。HCOO−aq与OH aq相互作用，OH aq是由OH气相溶剂化产生的。所得的HCOO−aq浓度以先前报道的实验测量值为基准。液滴直径、初始HCOO - aq浓度和气体流速仅影响HCOO - aq浓度和OH - aq密度，不影响气相OH密度。粉末沉积和气体混合物（如h2o的百分比）改变了气相和液相化学。总的趋势是：在液滴暴露于等离子体的第一部分，OH - aq主要消耗HCOO - aq，然而，当o2 - aq达到临界大密度时，作为HCOO - aq消耗的副产物，o2 - aq消耗OH - aq。使用HCOO - aq作为OH - aq敏感污染物的替代品，停留时间、液滴直径、水蒸气密度和功率的组合将确定最佳的修复策略。
Plasmas in contact with liquids can degrade organic molecules in a solution, as reactive oxygen and nitrogen species produced in the plasma solvate into the liquid. Immersing small droplets (tens of microns in diameter) in the plasma can more rapidly activate the liquid compared to treating a large volume of liquid with a smaller surface-to-volume ratio. The interactions between a radio frequency glow discharge sustained in He/H 2 O and a water droplet containing formate (HCOO− aq) immersed in and flowing through the plasma were modeled using a zero-dimensional global plasma chemistry model to investigate these activation processes. HCOO− aq interacts with OH aq, which is produced from the solvation of OH from the gas phase. The resulting HCOO− aq concentrations were benchmarked with previously reported experimental measurements. The diameter of the droplet, initial HCOO− aq concentration, and gas flow rate affect only the HCOO− aq concentration and OH aq density, leaving the OH density in the gas phase unaffected. Power deposition and gas mixture (eg percentage of H 2 O) change both the gas and liquid phase chemistry. A general trend was observed: during the first portion of droplet exposure to the plasma, OH aq primarily consumes HCOO− aq. However, O 2− aq, a byproduct of HCOO− aq consumption, consumes OH aq once O 2− aq reaches a critically large density. Using HCOO− aq as a surrogate for OH aq-sensitive contaminants, combinations of residence time, droplet diameter, water vapor density, and power will determine the optimum remediation strategy.