Morphology of Nanostructured Polymer Brushes Dependent on Production and Treatment
Morphology of Nanostructured Polymer Brushes Dependent on Production and Treatment
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DOI：
10.1021/acs.macromol.7b00714
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发表时间：
2017-06-27
期刊：
影响因子：
5.5
通讯作者：
Ruehe, Juergen
中科院分区：
文献类型：
--
作者：
Chen, Wei-Liang;Menzel, Matthias;Ruehe, Juergen
研究了自上而下和自下而上的纳米中性电刷的形貌随生产工艺和所接触的溶剂的质量的变化。采用表面引发自由基链聚合(SI-RCP)方法在基材上接枝了聚甲基丙烯酸叔丁酯(PtBuMA)中性刷子。采用自顶向下(TD)或自底向上(3.0)的方法使用深紫外光(DUV)光刻进行刷子图案化，图案化的线条小至200 nm。将得到的刷子浸泡在甲苯或甲醇中，并用轻拍模式原子力显微镜(AFM)监测干燥刷子的形貌变化：TD纳米粒子刷子(NPB)在生产过程中直接生成透镜状刷子，TD纳米粒子刷子(NPB)呈现出类似透镜的形状。-我们表明，BU刷子的图形宽度不仅取决于图形邻近区域的润湿性能，还取决于工艺历史。样本已经暴露在其中。特别是溶剂性。此外，由于刷子图案化过程中的高能工艺条件，我们证明了TD NPB在图案的边缘是交联的，并研究了由此获得的结构的行为。
The morphology of top-down and bottom-up nanostructured neutral brushes is studied as a function of the production process and the quality of solvent to which the brushes have been exposed. Neutral brushes of poly(tert-butyl methacrylate) (PtBuMA) were grafted from the substrate by surface-initiated radical-chain polymerization (SI-RCP). Brush patterning was conducted using deep ultraviolet (DUV) photolithography following either top-down (TD) or bottom-up (3.0) approaches with patterned lines as small as 200 nm. The resulting brushes were immersed in toluene or methanol, and the change of morphology of the dried brushes was monitored using tapping mode atomic force microscopy (AFM): TD nanopatterned brushes (NPBs) exhibit a box-like and BU generated brushes a lens-like shape directly after the production process.-We show that the pattern width for the BU brushed depends not only on the wetting properties of the areas adjacent to the pattern but also on the process history. to which the sample has been exposed,. especially the solvent quality. Furthermore, we show that TD NPBs are cross-linked on the edges of the pattern because of the high-energy process conditions during brush patterning and study the behavior of the-thus-obtained structures.