Analysis of tellurium thin films electrodeposition from acidic citric bath
Analysis of tellurium thin films electrodeposition from acidic citric bath
复制标题
DOI：
10.1016/j.apsusc.2016.03.127
复制
发表时间：
2016-12
影响因子：
6.7
通讯作者：
R. Kowalik;D. Kutyła;K. Mech;P. Żabiński
中科院分区：
文献类型：
--
作者：
R. Kowalik;D. Kutyła;K. Mech;P. Żabiński
本文描述了在柠檬酸溶液中形成碲薄层的电化学过程。建议的方法包括在制备稳定的酸性浴与高含量的碲，并添加柠檬酸。为了分析碲沉积过程的机理，进行了电分析试验。用多晶金盘电极进行了循环伏安法和流体动力学试验。确定了在直接四电子过程中可能沉积碲的电位范围，以及沉积的Te°还原为Te 2 −及其作为歧化反应结果的再沉积。在此基础上，采用恒电位法进行碲的沉积。研究了沉积电位和溶液中TeO2浓度对碲涂层沉积速率的影响。碲的存在，证实了X射线荧光光谱法和电子探针微量分析。为了确定相组成和形态，使用X射线衍射和扫描电子显微镜对所得涂层进行了分析。
This work presents the description of the electrochemical process of formation thin tellurium layers from citrate acidic solution. The suggested methodology consists in the preparation of stable acidic baths with high content of tellurium, and with the addition of citrate acid. In order to analyse the mechanism of the process of tellurium deposition, the electroanalytical tests were conducted. The tests of cyclic voltammetry and hydrodynamic ones were performed with the use of polycrystalline gold disk electrode. The range of potentials in which deposition of tellurium in direct four-electron process is possible was determined as well as the reduction of deposited Te° to Te2−and its re-deposition as a result of the comproportionation reaction. On the basis of the obtained results, the deposition of tellurium was conducted by the potentiostatic method. The influence of a deposition potential and a concentration of TeO2in the solution on the rate of tellurium coatings deposition was examined. The presence of tellurium was confirmed by X-ray spectrofluorometry and electron probe microanalysis. In order to determine the phase composition and the morphology, the obtained coatings were analysed with the use of x-ray diffraction and scanning electron microscopy.