Sparse-exposure technique in holographic two-photon polymerization.
Sparse-exposure technique in holographic two-photon polymerization.
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DOI：
10.1364/oe.16.016592
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发表时间：
2008-10
期刊：
影响因子：
3.8
通讯作者：
Hidetomo Takahashi;S. Hasegawa;A. Takita;Y. Hayasaki
中科院分区：
文献类型：
--
作者：
Hidetomo Takahashi;S. Hasegawa;A. Takita;Y. Hayasaki
全息双光子聚合基于感光材料内部的高速、低损耗并行激光照射技术，使用计算机生成的全息图显示在液晶空间光调制器上。我们展示了一种结合平行曝光和扫描曝光的稀疏曝光技术，以提高制造产量并实现不同宽度的线性结构的同时制造。我们还演示了通过改变 CGH 来制造空变结构，以及使用单飞秒激光脉冲照射并行制造体素结构。
Holographic two-photon polymerization is based on a high-speed, low-loss parallel laser irradiation technique inside photosensitive materials using a computer-generated hologram displayed on a liquid crystal spatial light modulator. We demonstrated a sparse exposure technique combining parallel exposure and scanning exposure to improve the fabrication throughput and to achieve simultaneous fabrication of linear structures with different widths. We also demonstrated fabrication of space-variant structures by changing a CGH, as well as parallel fabrication of voxel structures with single femtosecond laser pulse irradiation.