Magnetron sputtering deposition of Pr12.5Fe77.5B10 thin films and substrate temperature dependence of the magnetic properties
Magnetron sputtering deposition of Pr12.5Fe77.5B10 thin films and substrate temperature dependence of the magnetic properties
复制标题
DOI：
10.1088/0022-3727/42/2/025004
复制
发表时间：
2009-01
期刊：
影响因子：
--
通讯作者：
Wenyong Zhang;H. Shima;F. Takano;M. Takenaka;H. Akinaga;S. Nimori
中科院分区：
文献类型：
--
作者：
Wenyong Zhang;H. Shima;F. Takano;M. Takenaka;H. Akinaga;S. Nimori
采用磁控溅射法在热氧化的Si衬底上制备了Pr_（12.5）Fe_（77.5）B_（10）薄膜。在沉积过程中，通过控制衬底温度，改变了微结构和磁性能。用磁力显微镜观察了室温下沉积的均匀非晶薄膜中由垂直磁各向异性引起的条形磁畴结构。相比之下，在600 °C下沉积的膜中证明了导致磁硬化的交换耦合磁畴。这些结果表明，很大的可能性Pr12.5Fe77.5B10薄膜的电磁驱动微机电应用。
Thin films of Pr12.5Fe77.5B10 have been successfully fabricated on thermally oxidized Si substrates by magnetron sputtering deposition. The microstructure and magnetic properties were altered by controlling the substrate temperature during the deposition. The stripe magnetic domain structure arising from the perpendicular magnetic anisotropy was observed by a magnetic force microscope in the uniform amorphous film deposited at room temperature. In contrast, the exchange coupled magnetic domain leading to the magnetic hardening was evidenced in the film deposited at 600 °C. These results suggest the great possibility of Pr12.5Fe77.5B10 thin films for electromagnetically actuated microelectromechanical applications.