Micro/nano glass press molding using silicon carbide molds fabricated by silicon lost molding
Micro/nano glass press molding using silicon carbide molds fabricated by silicon lost molding
复制标题
使用硅消失模制造的碳化硅模具进行微/纳米玻璃压制成型
DOI：
10.1109/memsys.2005.1453970
复制
发表时间：
2005
期刊：
影响因子：
--
通讯作者：
M. Esashi
中科院分区：
文献类型：
--
作者：
K. Min;S. Tanaka;M. Esashi
以硅模具为原料，制备了用于微纳玻璃高温模压成型的碳化硅（SiC）模具。采用光刻和刻蚀技术制备了具有微光学特性的硅模，并在硅模上沉积了SiC。将SiC表面抛光成镜面后，在900 ℃下使用镍中间层将SiC陶瓷块与SiC膜结合。最后，使用硝酸和氢氟酸的混合物蚀刻掉硅模具。SiC模具的表面粗糙度为1.2nm Ra，这与硅模具的表面粗糙度几乎相同。这表明该工艺有望用于制造用于光学用途的SiC模具。使用涂覆有类金刚石碳（DLC）的SiC模具在400 /spl deg/C下初步进行玻璃压制成型。尽管由于SiC-SiC键合质量差，SiC薄膜的某些部分被剥离，但SiC模具上的特征被很好地转移到玻璃上。
Silicon carbide (SiC) molds for micro/nano glass press molding at high temperature were fabricated from a silicon mold. The silicon molds with the features of micro-optics were fabricated by photolithography and etching and then SiC was deposited on the silicon mold. After the SiC surface was polished to a mirror surface, a SiC ceramic block was bonded with the SiC film using a nickel interlayer at 900 /spl deg/C. Finally, the silicon mold was etched away using the mixture of nitric acid and hydrofluoric acid. The surface roughness of the SiC mold is 1.2 nm Ra, which is almost identical with that of the silicon mold. This suggests that this process is promising to make the SiC mold for optical uses. Glass press molding was preliminarily performed at 400 /spl deg/C using the SiC mold coated with diamond-like carbon (DLC). Although some parts of the SiC film were peeled off due to poor SiC-SiC bonding quality, the features on the SiC mold were well transferred to the glass.