Grain-Size Enlargement of MoS2 Film by Low-Rate Sputtering with Molybdenum Grid
Grain-Size Enlargement of MoS2 Film by Low-Rate Sputtering with Molybdenum Grid
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DOI：
10.1109/edtm55494.2023.10103043
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发表时间：
2023-03
期刊：
影响因子：
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通讯作者：
Shinya Imai;Ryo Ono;I. Muneta;K. Kakushima;T. Tatsumi
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文献类型：
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作者：
Shinya Imai;Ryo Ono;I. Muneta;K. Kakushima;T. Tatsumi
低速率溅射与钼网格降低$\text{MoS}_{2}$薄膜的沉积速率，扩大晶粒尺寸测量的平面X射线衍射。通过拉曼光谱测试，薄膜的结晶度得到了改善，这是因为低速率溅射提高了S/Mo比。这为pn-堆叠2D-CMOS器件提供了更好的$\text{MoS}_{2}$膜。
Low-rate sputtering with a molybdenum grid reduced the deposition rate of $\text{MoS}_{2}$ films, enlarging a grain size measured by in-plane X-ray diffraction. The $\text{MoS}_{2}$ film crystallinity evaluated by the Raman spectroscopy was improved because the S/Mo ratio was also enhanced by the low-rate sputtering. They contributed to a better-quality of $\text{MoS}_{2}$ film for pn-stacked 2D-CMOS devices.