Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system
Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system
复制标题
反应高功率脉冲磁控溅射结合等离子体离子注入系统制备导电硅掺杂类金刚石碳薄膜
DOI：
10.1016/j.diamond.2019.107635
复制
发表时间：
2020
影响因子：
4.1
通讯作者：
K. Azuma
中科院分区：
文献类型：
--
作者：
Y. Shibata;T. Kimura;S. Nakao;K. Azuma
