beta-Ga2O3 versus epsilon-Ga2O3: Control of the crystal phase composition of gallium oxide thin film prepared by metal-organic chemical vapor deposition
beta-Ga2O3 versus epsilon-Ga2O3: Control of the crystal phase composition of gallium oxide thin film prepared by metal-organic chemical vapor deposition
复制标题
β-Ga2O3 与 epsilon-Ga2O3:金属有机化学气相沉积制备氧化镓薄膜晶相组成的控制
DOI:
10.1016/j.apsusc.2017.05.241
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发表时间:
2017
影响因子:
6.7
通讯作者:
Wang Gang
中科院分区:
文献类型:
--
作者:
Zhuo Yi;Chen Zimin;Tu Wenbin;Ma Xuejin;Pei Yanli;Wang Gang
Gallium oxide thin films of β and ε phase were grown onc-plane sapphire using metal-organic chemical vapor deposition and the phase compositions were analyzed using X-ray diffraction. The epitaxial phase diagram was constructed as a function of the growth temperature and VI/III ratio. A low growth temperature and low VI/III ratio were beneficial for the formation of hexagonal-type ε-Ga2O3. Further structure analysis revealed that the epitaxial relationship between ε-Ga2O3andc-plane sapphire is ε-Ga2O3(0001) || Al2O3(0001) and ε-Ga2O3|| Al2O3. The structural evolution of the mixed-phase sample during film thickening was investigated. By reducing the growth rate, the film evolved from a mixed phase to the energetically favored ε phase. Based on these results, a Ga2O3thin film with a phase-pure ε-Ga2O3upper layer was successfully obtained.