Inelastic Scattering of H Atoms from Surfaces.

Inelastic Scattering of H Atoms from Surfaces.
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DOI:
10.1021/acs.jpca.1c00361
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发表时间:
2021-04-22
期刊:
The journal of physical chemistry. A
影响因子:
--
通讯作者:
Wodtke AM
Wodtke AM
中科院分区:
其他
文献类型:
--
作者:
Bünermann O;Kandratsenka A;Wodtke AM

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我们开发了一种仪器,它利用卤化氢的光解产生几乎单能的氢原子束,并使用里德堡原子标记来获得从表面散射的原子的精确角度分辨飞行时间分布。表面是在严格的超高真空条件下制备的。这些实验数据可以为理论提供极好的基准,从而有可能从原子尺度上了解支配氢原子吸附的潜在动力学过程。从而揭示了金属表面的吸附机理,表现为一种依靠氢原子对金属的电子激发而成功的渗透-重堆焊机理。相比之下,当H原子在石墨烯表面碰撞时,至少涉及四个碳原子的键形成的动力学决定了吸附。展望了氢原子表面散射的研究前景。
We have developed an instrument that uses photolysis of hydrogen halides to produce nearly monoenergetic hydrogen atom beams and Rydberg atom tagging to obtain accurate angle-resolved time-of-flight distributions of atoms scattered from surfaces. The surfaces are prepared under strict ultrahigh vacuum conditions. Data from these experiments can provide excellent benchmarks for theory, from which it is possible to obtain an atomic scale understanding of the underlying dynamical processes governing H atom adsorption. In this way, the mechanism of adsorption on metals is revealed, showing a penetration–resurfacing mechanism that relies on electronic excitation of the metal by the H atom to succeed. Contrasting this, when H atoms collide at graphene surfaces, the dynamics of bond formation involving at least four carbon atoms govern adsorption. Future perspectives of H atom scattering from surfaces are also outlined.
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