Metal-seed assistant photodeposition of platinum over Ta3N5 photocatalyst for promoted solar hydrogen production under visible light

Metal-seed assistant photodeposition of platinum over Ta3N5 photocatalyst for promoted solar hydrogen production under visible light
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Ta_3N_5光催化剂上金属种子辅助光沉积铂促进可见光下太阳能产氢

DOI:
10.1016/j.jechem.2020.07.034
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发表时间:
2021-04-01
影响因子:
13.1
通讯作者:
Zhang, Fuxiang
Zhang, Fuxiang
中科院分区:
化学1区
文献类型:
--
作者:
Lian, Juhong;Li, Deng;Zhang, Fuxiang

文献摘要

被引文献

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助催化剂在加速太阳能制氢光催化剂的反应动力学和改善电荷分离方面起着至关重要的作用。光催化活性的提高很大程度上取决于助催化剂的负载方式。本文采用金属种子辅助光沉积的方法,将铂的析氢助催化剂负载在Ta3N5光催化剂表面,其光催化质子还原活性比相应的浸渍或光沉积负载高3.6倍。基于我们的表征,我们提出了金属种子辅助光沉积法中助催化剂/半导体界面接触面积的增加是促进电荷分离和光催化H-2演化活性增强的原因。有趣的是,这种创新的沉积策略可以很容易地扩展到用其他贵金属或非贵金属种子加载铂助催化剂以促进活性,显示出其良好的通用性。我们的工作可能为更好的光催化性能提供另一种沉积助催化剂的方法。(C) 2020科学出版社,中国科学院大连化学物理研究所。由ELSEVIER B.V.和科学出版社出版。版权所有。
Cocatalysts play a vital role in accelerating the reaction kinetics and improving the charge separation of photocatalysts for solar hydrogen production. The promotion of the photocatalytic activity largely relies on the loading approach of the cocatalysts. Herein, we introduce a metal-seed assistant photodeposition approach to load the hydrogen evolution cocatalyst of platinum onto the surface of Ta3N5 photocatalyst, which exhibits about 3.6 times of higher photocatalytic proton reduction activity with respect to the corresponding impregnation or photodeposition loading. Based on our characterizations, the increscent contact area of the cocatalyst/semiconductor interface with metal-seed assistant photodeposition method is proposed to be responsible for the promoted charge separation as well as enhanced photocatalytic H-2 evolution activity. It is interesting to note that this innovative deposition strategy can be easily extended to loading of platinum cocatalyst with other noble or non-noble metal seeds for promoted activities, demonstrating its good generality. Our work may provide an alternative way of depositing cocatalyst for better photocatalytic performances. (C) 2020 Science Press and Dalian Institute of Chemical Physics, Chinese Academy of Sciences. Published by ELSEVIER B.V. and Science Press. All rights reserved.