Two-photon lithography of nanorods in SU-8 photoresist
Two-photon lithography of nanorods in SU-8 photoresist
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DOI：
10.1088/0957-4484/16/6/039
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发表时间：
2005-06-01
期刊：
影响因子：
3.5
通讯作者：
Misawa, H
中科院分区：
文献类型：
--
作者：
Juodkazis, S;Mizeikis, V;Misawa, H
在负性SU-8光致抗蚀剂中对双光子光刻的研究证明了获得具有约30 nm的横向尺寸（对应于λ/25分辨率）的机械稳定的、无应力的、延伸的纳米棒的可能性。给定的材料和制造技术的组合可实现的高分辨率展示了其用于制造大规模纳米结构的潜力，例如在可见波长处具有光子阻隙的光子晶体。
Studies on two-photon lithography in negative SU-8 photoresist demonstrate the possibility of obtaining mechanically stable, stress-free, extended nanorods having lateral sizes of about 30 nm (corresponding to lambda/25 resolution). The high resolution achievable with the given combination of materials and fabrication techniques demonstrates its potential for the fabrication of large-scale nanostructures, such as photonic crystals with photonic stop gaps at visible wavelengths.