A Particle-In-Cell approach to particle flux shaping with a surface mask
A Particle-In-Cell approach to particle flux shaping with a surface mask
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DOI：
10.1016/j.nme.2016.12.017
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发表时间：
2017-01
影响因子：
2.6
通讯作者：
G. Kawamura;N. Ohno;S. Takamura;Y. Tomita
中科院分区：
文献类型：
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作者：
G. Kawamura;N. Ohno;S. Takamura;Y. Tomita
为了研究具有台阶型和屋顶型两种掩模的表面前等离子体，开发了细胞内粒子模拟程序PICS。对磁场角度、电子密度和掩膜高度进行参数扫描，了解它们对表面离子粒子通量分布的影响。掩模高度小的顶板掩模在通量分布中的衰减长度较短，与实验估计一致。具有大高度的顶盖型掩模产生很长的衰减长度，通量值不取决于掩模高度或电子密度，而是取决于掩模长度和表面的偏置电压。由于遮罩的遮光效果，遮罩高度也改变了除遮罩外的通量分布。电子密度根据德拜长度改变掩膜边缘附近的分布。分布对参数的依赖关系是复杂的，特别是对于顶板型掩模，不同参数的模拟研究有助于理解分布对参数依赖的物理原因，也有助于作为实验研究的工具。
The Particle-In-Cell simulation code PICS has been developed to study plasma in front of a surface with two types of masks, step-type and roof-type. Parameter scans with regard to magnetic field angle, electron density, and mask height were carried out to understand their influence on ion particle flux distribution on a surface. A roof-type mask with a small mask height yields short decay length in the flux distribution which is consistent with that estimated experimentally. A roof-type mask with a large height yields very long decay length and the flux value does not depend on a mask height or an electron density, but rather on a mask length and a biasing voltage of the surface. Mask height also changes the flux distribution apart from the mask because of the shading effect of the mask. Electron density changes the distribution near the mask edge according to the Debye length. Dependence of distribution on parameters are complicated especially for a roof-type mask, and simulation study with various parameters are useful to understand the physical reasons of dependence and also is useful as a tool for experiment studies.