Wear behavior of the abrasive grains used in optical glass polishing
Wear behavior of the abrasive grains used in optical glass polishing
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DOI：
10.1016/j.jmatprotec.2009.04.012
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发表时间：
2009-11
影响因子：
6.3
通讯作者：
N. Belkhir;D. Bouzid;V. Herold
中科院分区：
文献类型：
--
作者：
N. Belkhir;D. Bouzid;V. Herold
本文研究了氧化铈磨粒在玻璃抛光过程中的磨损行为。用不同类型的氧化铈磨粒进行了抛光试验。在操作过程中回收并检查了颗粒。对回收颗粒的形貌、粒度分布、化学成分及团聚现象进行了研究。结果表明，断裂是氧化铈磨粒磨料磨损的主要原因，使磨粒在加工过程中长时间保持其初始形态。氧化铈磨粒在抛光过程中会发生局部磨损，这与工艺参数密切相关。磨料粉在抛光过程中存在较多的颗粒团聚现象，产生较大的颗粒，影响产品质量。
In this work the wear behavior of cerium oxide abrasive grains during the glass polishing was studied. Polishing tests have been done by different types of cerium oxide abrasive grains. The grains have been recovered and examined during the operation. The morphology, the granulometric distribution, the chemical composition and the agglomeration phenomenon of recovered grains have been studied. The results showed that the fracture is the main cause of the abrasive grain wear of the cerium oxide abrasive grains, which permitted to the abrasive grains to preserve their initial morphology for a long time during the process. The cerium oxide abrasive grains undergo a partial wear during their use in polishing and it is closely related to the process parameters. The granular agglomeration phenomenon of the abrasive powder is very much present in the polishing process and generates bigger grains being able to influence the product quality.