In situ wavelength tuning of quantum-dot single-photon sources integrated on a CMOS-processed silicon waveguide
In situ wavelength tuning of quantum-dot single-photon sources integrated on a CMOS-processed silicon waveguide
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DOI：
10.1063/1.5129325
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发表时间：
2019-09
影响因子：
4
通讯作者：
R. Katsumi;Y. Ota;A. Osada;T. Tajiri;Takuto Yamaguchi;M. Kakuda;S. Iwamoto;H. Akiyama;Y. Arakawa
中科院分区：
文献类型：
--
作者：
R. Katsumi;Y. Ota;A. Osada;T. Tajiri;Takuto Yamaguchi;M. Kakuda;S. Iwamoto;H. Akiyama;Y. Arakawa
硅量子光子学利用互补金属氧化物半导体（CMOS）技术的优势，为实现大规模量子光子集成电路（QPIC）提供了一条很有前途的途径。为了实现这种硅基QPIC的可扩展操作，一种直接的方法是集成确定性单光子源（SPS）。为此，混合集成的确定性固态SPS，如那些基于InAs/GaAs量子点（QD），是非常有前途的。然而，量子点固有的光谱和空间随机性对在硅CMOS芯片上可扩展地实现多个相同的SPS提出了严峻的挑战。为了克服这一挑战，我们一直在研究一种新的混合集成技术，称为转移印刷，这是基于一个拾取和放置操作，并允许所需的QD SPS的硅CMOS芯片上的任何位置上的集成。然而，即使在这种情况下，对于来自不同来源的干扰光子，将需要在集成QD SPS之间进行原位微调以实现完美的波长匹配。在这里，我们展示了在现场的QD SPS集成在CMOS硅芯片上的波长调谐。为了热调谐集成QD的发射波长，我们用光学驱动加热垫增强QD SPS。所有必要元件的集成都是使用转印进行的，这在很大程度上简化了微/纳米光子结构的三维堆叠的制造。我们进一步展示了在同一硅片上集成的两个不同的量子点源之间的原位波长匹配。我们基于转印的方法将为实现利用CMOS技术的大规模QPIC提供可能性。
Silicon quantum photonics provides a promising pathway to realize large-scale quantum photonic integrated circuits (QPICs) by exploiting the power of complementary-metal-oxide-semiconductor (CMOS) technology. Toward scalable operation of such silicon-based QPICs, a straightforward approach is to integrate deterministic single-photon sources (SPSs). To this end, hybrid integration of deterministic solid-state SPSs, such as those based on InAs/GaAs quantum dots (QDs), is highly promising. However, the spectral and spatial randomness inherent in the QDs pose a serious challenge for scalable implementation of multiple identical SPSs on a silicon CMOS chip. To overcome this challenge, we have been investigating a new hybrid integration technique called transfer printing, which is based on a pick-and-place operation and allows for the integration of desired QD SPSs on any locations on the silicon CMOS chips at will. Nevertheless, even in this scenario, in-situ fine tuning for perfect wavelength matching among the integrated QD SPSs will be required for interfering photons from the dissimilar sources. Here, we demonstrate in-situ wavelength tuning of QD SPSs integrated on a CMOS silicon chip. To thermally tune the emission wavelengths of the integrated QDs, we augmented the QD SPSs with optically driven heating pads. The integration of all the necessary elements was performed using transfer printing, which largely simplified the fabrication of the three-dimensional stack of micro/nanophotonic structures. We further demonstrate in-situ wavelength matching between two dissimilar QD sources integrated on the same silicon chip. Our transfer-printing-based approach will open the possibility for realizing large-scale QPICs that leverage CMOS technology.