Investigation on microstructures of MnSi x thin films by Raman spectroscopy
Investigation on microstructures of MnSi x thin films by Raman spectroscopy
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DOI：
10.1002/jrs.2122
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发表时间：
2009-03
影响因子：
2.5
通讯作者：
Jennifer Wang;W. Su;R. Xu;Yongliang Fan;Jiang-Shan Zhu
中科院分区：
文献类型：
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作者：
Jennifer Wang;W. Su;R. Xu;Yongliang Fan;Jiang-Shan Zhu
本文采用拉曼光谱研究了不同温度退火的MnSix薄膜的微观结构。确定了锰硅化物的两个相：MnSi 1.73和MnSi，并报道了它们的拉曼光谱。锰硅化物的每个相在光谱中在约300 cm−1处显示出一组三个明确定义的峰，这可以用作识别锰硅化物形成的指纹。与传统的X射线衍射方法相比，拉曼光谱在研究锰硅化物的微观结构，特别是在锰硅化物形成的初始阶段具有更高的灵敏度。版权所有© 2008约翰威利父子有限公司。
In this paper, Raman spectroscopy is used to study the microstructures of MnSix thin films annealed at different temperatures. Two phases of Mn silicides, MnSi1.73 and MnSi, are identified, and their Raman spectra are reported. Each phase of Mn silicides shows a set of three well-defined peaks at about 300 cm−1 in the spectrum, which could be used as fingerprints in identifying the formation of the Mn silicides. Compared with conventional X-ray diffraction method, Raman spectroscopy is found to be more sensitive to investigate the microstructures of Mn silicides, especially at the initial stage of formation of the Mn silicides. Copyright © 2008 John Wiley & Sons, Ltd.