Development of ultrahigh vacuum-atomic force microscopy with frequency modulation detection and its application to electrostatic force measurement
Development of ultrahigh vacuum-atomic force microscopy with frequency modulation detection and its application to electrostatic force measurement
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调频检测超高真空原子力显微镜的研制及其在静电力测量中的应用
DOI：
10.1116/1.589396
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发表时间：
1997
影响因子：
1.4
通讯作者：
S. Morita
中科院分区：
文献类型：
--
作者：
T. Uchihashi;M. Ohta;Y. Sugawara;Y. Yanase;Tatsuhiko Sigematsu;Mineharu Suzuki;S. Morita
我们成功地在高分辨率的力的测量，使用非接触式超真空原子力显微镜（UHV-AFM）与调频（FM）检测。我们在Si（111）7×7重构表面上清晰地观察到了吸附原子和角孔。在此基础上，我们将FM探测的非接触式超高压原子力显微镜应用于静电力的高分辨率测量。我们防止恶化的空间分辨率的地形隔离静电相互作用的货车德瓦耳斯相互作用。通过同时测量氧化硅表面的形貌和静电力，实现了静电力的空间分辨率为15 A。
We succeeded in high resolution force measurements by using a noncontact ultrahigh vacuum-atomic force microscope (UHV-AFM) with frequency modulation (FM) detection. We clearly observed adatoms and corner holes on the Si(111)7×7 reconstructed surface. Then we applied the noncontact UHV-AFM with FM detection to the high resolution measurement of the electrostatic force. We prevented deterioration of the spatial resolution of the topography by isolating the electrostatic interaction from van der Waals interaction. By simultaneous measurements of the topography and electrostatic force on a silicon oxide, a spatial resolution ∼15 A of the electrostatic force was achieved.