Advanced Deposition of Hard-a-C:Me Coatings by HPPMS using Ne as Process Gas
Advanced Deposition of Hard-a-C:Me Coatings by HPPMS using Ne as Process Gas
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DOI：
10.1016/j.surfcoat.2017.07.089
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发表时间：
2017-12
影响因子：
5.4
通讯作者：
K. Bobzin;T. Brögelmann;N. Kruppe;M. Engels
中科院分区：
文献类型：
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作者：
K. Bobzin;T. Brögelmann;N. Kruppe;M. Engels
类金刚石碳 (DLC) 涂层用于多种摩擦学应用，例如汽车动力系统的高负载部件。这些涂层的高硬度和低粗糙度有助于减少摩擦接触中的部件磨损。研究表明，使用氖气作为工艺气体，通过高功率脉冲磁控溅射 (HPPMS) 可以沉积低粗糙度的硬质 a-C 涂层。此外，用金属掺杂a-C涂层是当前研究的主题。这些 a-C:Me 涂层表现出涂层性能的显着变化，这可能有助于提高摩擦学应用中的性能。因此，在目前的工作中，使用一个带有 Zr 靶的直流磁控溅射阴极和一个带有石墨靶的 HPPMS 阴极，使用 Ne 作为工艺气体，通过混合工艺在大批量半工业镀膜装置中成功沉积了 a-C:Me 涂层。此外，使用两个 HPPMS 阴极沉积涂层。使用两种工艺进行涂层沉积，以评估 dcMS 和 HPPMS 分别对两种工艺的涂层性能和经济效率的影响。具有 Zr 靶材的阴极的平均功率在 dcMS 模式和 HPPMS 模式下是变化的，而具有 C 靶材的阴极在 HPPMS 模式下持续供电。 HPPMS 工艺观察到微观结构致密化。此外，涂层中C和Zr的比例不同，导致相组成不同。可以沉积最大通用硬度 HU = 25 GPa 和算术平均粗糙度 Ra = 0.03 μm 的涂层。
Diamond-like carbon (DLC) coatings are used in numerous tribological applications, for example on highly-loaded components of the automotive powertrain. The high hardness and low roughness of these coatings contribute to the reduction of the component wear in tribological contact. It has been shown that hard a-C coatings with a low roughness can be deposited by means of high power pulsed magnetron sputtering (HPPMS) using Ne as process gas. Furthermore, the doping of a-C coatings with metals is the subject of current research. These a-C:Me coatings exhibit significant changes of the coating properties, which might contribute to a performance increase in tribological applications. Hence, in the present work a-C:Me coatings were successfully deposited in a high-volume semi-industrial coating unit by means of a hybrid process using one direct current magnetron sputtering cathode with a Zr target and one HPPMS cathode with a graphite target, using Ne as process gas. Furthermore, coatings were deposited using two HPPMS cathodes. The deposition of coatings using both types of processes was conducted in order to evaluate the influence of dcMS and HPPMS on the coating properties and the economic efficiency of both processes, respectively. The average power of the cathode with the Zr target was varied in the dcMS mode and in the HPPMS mode, whereas the cathode with the C target was powered constantly in HPPMS mode. A densification of the microstructure was observed for the HPPMS processes. Furthermore, different ratios of C and Zr in the coating were obtained, which resulted in a varying phase composition. Coatings with a maximum universal hardness HU = 25 GPa and arithmetic mean roughness Ra = 0.03 μm could be deposited.