FORMATION OF IRON FILM BY ION-BEAM DEPOSITION
FORMATION OF IRON FILM BY ION-BEAM DEPOSITION
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DOI：
10.1016/s0257-8972(94)80034-0
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发表时间：
1994-07-01
影响因子：
5.4
通讯作者：
MINEMURA, T
中科院分区：
文献类型：
--
作者：
MIYAKE, K;OHASHI, K;MINEMURA, T
为了研究非平衡离子辅助薄膜生长过程中离子与固体之间的相互作用，建立了一套低能、质量分离的离子束沉积（IBD）系统。使用该系统，在室温下，在50和100 eV的离子能量下，在硅衬底上形成高纯度和高耐蚀性的铁膜。从离子-固体相互作用的角度讨论了IBD Fe膜具有比其他高纯Fe金属和不锈钢更高的耐蚀性的原因。有一个净化效果，由于质量分离和增强的表面原子迁移，由于低能离子轰击，这似乎是负责形成一个稳定的表面氧化铁层，这有助于高的IBD Fe膜的耐腐蚀性。
A low-energy, mass-separated ion beam deposition (IBD) system was developed to investigate fundamental ion-solid interactions which play major roles in thermal non-equilibrium ion-assisted film growth. Using the system, high purity and highly corrosion resistant iron films were formed on silicon substrates at room temperature with ion energies of 50 and 100 eV. The reason why the IBD Fe films had such a high corrosion resistance compared with other high purity Fe metals and stainless steel is discussed from the viewpoint of ion-solid interactions. There is a purification effect due to mass separation and also enhanced surface atom migration due to low energy ion bombardment which seem to be responsible for the formation of a stable surface iron oxide layer, which contributes to the high corrosion resistance of the IBD Fe films.