THE MECHANISM OF TEXTURE FORMATION DURING FILM GROWTH : THE ROLES OF PREFERENTIAL SPUTTERING AND SHADOWING
THE MECHANISM OF TEXTURE FORMATION DURING FILM GROWTH : THE ROLES OF PREFERENTIAL SPUTTERING AND SHADOWING
复制标题
DOI：
10.1063/1.116821
复制
发表时间：
1996-11
影响因子：
4
通讯作者：
F. Ying;R. Smith;D. Srolovitz
中科院分区：
文献类型：
--
作者：
F. Ying;R. Smith;D. Srolovitz
非平衡分子动力学模拟已被用于开发多晶薄膜中面外（纤维）织构发展的机理模型。沉积原子优先溅射表面能高的颗粒中的膜原子。随着薄膜的生长，原子遮蔽机制导致具有高度优势的晶粒横向生长，最终导致随机取向晶粒的遮挡。
Nonequilibrium molecular dynamics simulations have been employed to develop a mechanistic model for the development of an out‐of‐plane (fiber) texture in polycrystalline thin films. The depositing atoms preferentially sputter film atoms from grains with high surface energies. As the film grows, an atomic shadowing mechanism leads to the lateral growth of the grains with a height advantage—eventually leading to the occlusion of randomly oriented grains.