Intense EUV incoherent plasma sources for EUV lithography and other applications
Intense EUV incoherent plasma sources for EUV lithography and other applications
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DOI：
10.1109/3.760316
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发表时间：
1999-05-01
影响因子：
2.5
通讯作者：
Silfvast, WT
中科院分区：
文献类型：
--
作者：
Silfvast, WT
多年来，强可见光和紫外光源，无论是非相干的还是相干的，都已用于各种商业应用中。也许两个最深远的应用是在微光刻和材料加工领域。在微光刻中，汞蒸气放电灯为微光刻机提供照明光通量已有20多年。最近，准分子激光器在该领域中发挥着越来越大的作用。在材料加工中，由于稍后将讨论的通量要求，源在很大程度上限于激光器。可用的激光器覆盖宽范围的波长和脉冲持续时间，并且已经成为用于宽范围应用的主要工业工具。本文将指出，强烈的极紫外非相干（非激光）源可能在未来发挥的作用，因为它们可能能够提供类似的强度，目前只提供激光，但在一个更简单，更有效的方式，在某些系统中，在一个潜在的成本低得多。
Intense visible and ultraviolet sources, both incoherent and coherent, have been used in a variety of commercial applications over the years. Perhaps two of the most far-reaching applications are in the areas of microlithography and materials processing. In microlithography, the mercury vapor discharge lamp has provided the illuminating flux for microlithography machines for over 20 years. More recently, excimer lasers are playing an increasing role in this field, In materials processing, because of flux requirements that will be discussed later, sources have been largely restricted to lasers, The available lasers cover a wide range of wavelengths and pulse durations and have become major industrial tools for a broad spectrum of applications. This paper will point out the role that intense extreme ultraviolet incoherent (nonlaser) sources might play in the future, in that they may be able to provide similar intensities to those presently provided only by lasers, but in a much simpler, more efficient way and, in some systems, at a potentially much lower cost.