Soft Lithographic Approach to the Fabrication of Highly Ordered 2D Arrays of Magnetic Nanoparticles on the Surfaces of Silicon Substrates
Soft Lithographic Approach to the Fabrication of Highly Ordered 2D Arrays of Magnetic Nanoparticles on the Surfaces of Silicon Substrates
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DOI:
10.1021/la001211k
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发表时间:
2000-12
期刊:
影响因子:
3.9
通讯作者:
Z. Zhong;and Byron Gates;Younan Xia;D. Qin
中科院分区:
文献类型:
--
作者:
Z. Zhong;and Byron Gates;Younan Xia;D. Qin
This paper describes a simple and convenient method that uses patterned monolayers as templates to fabricate highly ordered 2D arrays of magnetic particles (Co, Ni, or α-Fe, and ferrites such as MgFe2O4 or NiFe2O4) with lateral dimensions in the range of 70−460 nm. In this method, the hydrophilic, hydroxyl-terminated surface of a Si/SiO2 wafer was patterned with a hydrophobic monolayer of octadecyltrichlorosilane using microcontact printing with an elastomeric stamp and subsequently used as template to define and deposit a regular 2D array of 2-propanol droplets that contained inorganic salts such as Co(NO3)2, Ni(NO3)2, and Fe(NO3)3, or a combination of these compounds. Evaporation of the solvent led to the formation of a 2D array of nitrate nanoparticles on the hydrophilic, bare regions of Si/SiO2. Each nanoparticle could be well-positioned within the hydrophilic region by withdrawing the substrate from the nitrate solution and by letting the solvent evaporate with the wafer being held at a specified ori...