Electrodeposition of cerium (III)-modified bis-[triethoxysilypropyl]tetra-sulphide films on AA2024-T3 (aluminum alloy) for corrosion protection
Electrodeposition of cerium (III)-modified bis-[triethoxysilypropyl]tetra-sulphide films on AA2024-T3 (aluminum alloy) for corrosion protection
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在 AA2024-T3（铝合金）上电沉积铈 (III) 改性双[三乙氧基甲硅烷基丙基]四硫化物薄膜以实现腐蚀防护
DOI：
10.1016/j.surfcoat.2010.05.027
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发表时间：
2010-08
影响因子：
5.4
通讯作者：
Li, J
中科院分区：
文献类型：
--
作者：
Liu, L;Zhang, JQ;Wu, LK;Cao, CN;Hu,JM;Li, J
稀土盐的掺杂，如铈（III），已被证明是提高硅烷膜的腐蚀性能，由于它们的自我修复行为。采用电辅助技术制备了具有较高耐蚀性的Ce（III）掺杂的BTESPT薄膜。采用电化学阻抗谱（EIS）、扫描电子显微镜（SEM）、X射线光电子能谱（XPS）、水接触角测量和傅里叶变换反射吸收红外光谱（FTRA-IR）等方法对薄膜进行了表征。结果表明，阴极沉积和铈掺杂均能促进硅烷膜的形成，提高硅烷膜在腐蚀介质中浸泡初期的防护能力。然而，似乎通过电沉积制备的Ce（III）掺杂的BTESPT膜在长期浸泡后失去了它们的自修复能力。原因尚不清楚，但可能是由于掺杂硅烷膜的电沉积过程中的铈（III）的氧化物或氢氧化物的沉淀。
The doping of rare earth salts, like Ce(III), has shown to enhance the corrosion performance of silane films due to their self-healing behaviors. In the present paper, the Ce(III)-doped bis-[triethoxysilypropyl]tetrasulphide (BTESPT) films with higher corrosion resistance were prepared by electro-assisted technique. The films were investigated using electrochemical impedance spectroscopy (EIS), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), water contact angle measurements and Fourier transform reflection absorption IR (FTRA-IR). The results showed that both the cathodic deposition and cerium-doping can promote the formation of thicker and compacter silane films and enhance their protectiveness in the early stage of immersion in the corrosive media. However, it seems that the Ce(III)-doped BTESPT films prepared by electrodeposition lose their self-healing abilities after long-term immersion. The reason is still unclear, but might be attributed to the precipitation of Ce(III) oxides or hydroxides during the electrodeposition of doped silane films.
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影响因子：
5.4
作者：
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影响因子：
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影响因子：
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作者：
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影响因子：
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