FePd, FePt, and CoPt alloy epitaxial thin films with flat surface grown on MgO(111) substrate
FePd, FePt, and CoPt alloy epitaxial thin films with flat surface grown on MgO(111) substrate
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MgO(111)衬底上生长的平坦表面的FePd、FePt和CoPt合金外延薄膜
DOI：
10.1051/epjconf/20147506008
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发表时间：
2014
影响因子：
--
通讯作者：
and Masaaki Futamoto
中科院分区：
文献类型：
--
作者：
Akira Itabashi;Mitsuru Ohtake;Shouhei Ouchi;Fumiyoshi Kirino;and Masaaki Futamoto
FePd, FePt, and CoPt alloy epitaxial films of 40 nm thickness are prepared on MgO(111) singlecrystal substrates by employing two different methods. One is a one-step method consisting of hightemperature deposition at 600 °C and the other is a two-step method consisting of low-temperature deposition at 200 °C followed by annealing at 600 °C. Although the preparation method is different, similar final crystal structures are realized for all the film materials. FePd and FePt alloy films grow on the substrates with sixL10(111) variants, whosec-axes are about 35° canted from the substrate surface and rotated around the film normal by 60° each other. The order degrees of FePd and FePt films prepared by one- and two-step methods, (Sone-step,Stwo-step), are estimated to be (0.25, 0.33) and (0.08, 0.15), respectively. On the contrary,L10ordered phase formation is not recognized for CoPt alloy films. The films prepared by one-step method have rough surfaces surrounded by side facets, whereas the films prepared by two-step method have very flat surfaces with the arithmetical mean roughness of 0.3 nm. The two-step method is useful for preparation ofL10ordered films with flat surface.
