Magnetic properties of Fe/Co, Fe/CoFe, and (Fe/Co)/SiO2 multilayer films
Magnetic properties of Fe/Co, Fe/CoFe, and (Fe/Co)/SiO2 multilayer films
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Fe/Co、Fe/CoFe 和 (Fe/Co)/SiO2 多层薄膜的磁性能
DOI：
10.1063/1.342690
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发表时间：
1989
期刊：
影响因子：
--
通讯作者：
Y. Nagai
中科院分区：
文献类型：
--
作者：
M. Senda;Y. Nagai
本文报告了对 Fe/Co、Fe/CoFe 和 (Fe/Co)/SiO2 多层薄膜的磁性能的系统研究。 Fe/Co 和 Fe/CoFe 薄膜中的磁致伸缩可以通过改变层的厚度来控制。 Fe/Co 薄膜 (10/0.5 nm) 显示出超过 2 T 的饱和磁化强度和 1.5 Oe 的硬轴矫顽力，磁致伸缩接近于零。通过300°C退火，硬轴矫顽力降低至0.8 Oe。该薄膜还建立了适用于薄膜磁头的磁畴结构。此外，未经退火的(Fe/Co)/SiO2薄膜[(15/0.5)/5 nm]实现了小于1 Oe的硬轴矫顽力、2000的相对磁导率和约2 T的饱和磁化强度。在该薄膜中观察到由延伸的 180° 壁组成的受控域结构。
This paper reports on the systematical investigation into the magnetic properties of Fe/Co, Fe/CoFe, and (Fe/Co)/SiO2 multilayer films. Magnetostriction in Fe/Co and Fe/CoFe films can be controlled by changing the thicknesses of the layers. The Fe/Co film (10/0.5 nm) shows saturation magnetization of more than 2 T and hard‐axis coercivity of 1.5 Oe for magnetostriction near zero. The hard‐axis coercivity is decreased to 0.8 Oe by 300 °C annealing. A magnetic domain structure suitable for a thin‐film head is also established for this film. Additionally, a hard‐axis coercivity of less than 1 Oe, a relative permeability of 2000, and a saturation magnetization of approximately 2 T are achieved in (Fe/Co)/SiO2 film [(15/0.5)/5 nm] with no annealing. A controlled domain structure consisting of extended 180° walls is observed in this film.