Hydrothermal Synthesis of Hollow Silica Spheres under Acidic Conditions
Hydrothermal Synthesis of Hollow Silica Spheres under Acidic Conditions
复制标题
DOI：
10.1021/la200719g
复制
发表时间：
2011-06-07
期刊：
影响因子：
3.9
通讯作者：
Wang, Xun
中科院分区：
文献类型：
--
作者：
Yu, Qiyu;Wang, Pengpeng;Wang, Xun
众所周知，二氧化硅可以在碱性介质或独特的氢氟酸（HF）溶液中蚀刻，这被广泛用于通过二氧化硅模板法制备各种中空纳米结构（包括二氧化硅中空结构）。在我们的实验中，我们发现stober二氧化硅球可以在水热条件下以良好控制的方式在通用酸性介质中蚀刻，形成轮廓分明的中空/摇铃型二氧化硅球。此外，NaCl和Na（2）SO（4）等盐也有利于空心球的形成。
It is well-known that silica can be etched in alkaline media or in a unique hydrofluoric acid (HF) solution, which is widely used to prepare various kinds of hollow nanostructures (including silica hollow structures) via silica-templating methods. In our experiments, we found that stober silica spheres could be etched in generic acidic media in a well-controlled way under hydrothermal conditions, forming well-defined hollow/rattle-type silica spheres. Furthermore, some salts such as NaCl and Na(2)SO(4) were found to be favorable for the formation of hollow/rattle-type silica spheres.