X-ray photoelectron spectroscopy study of thin TiO2 films cosputtered with Al
X-ray photoelectron spectroscopy study of thin TiO2 films cosputtered with Al
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DOI：
10.1364/ao.45.004303
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发表时间：
2006-06-20
期刊：
影响因子：
1.9
通讯作者：
Lee, Cheng-Chung
中科院分区：
文献类型：
--
作者：
Hsu, Jin-Cherng;Wang, Paul W.;Lee, Cheng-Chung
在本研究中，采用离子束溅射沉积的方法，将钛（Ti）靶和铝（Al）片在较小的面积上溅射制备二氧化钛（TiO2）薄膜。在450℃下对溅射膜进行了电镀层处理，并根据其氧键的变化进行了x射线光电子能谱的分类，包括高结合能氧（HBO）、桥接氧（bridging oxygen）、低结合能氧（low binding energy oxygen）以及氧(O)和Ti信号的结合能（BEs）的变化。薄膜中溅射的Al的增强和o1s光谱的高BE位移意味着Al-O- ti键的形成。相应的ti2p光谱变化进一步证实了化学成键环境的改变对溅射膜性能的影响。观察到的铝溅射薄膜的化学结构与光吸收之间的关系可以用来改变薄膜的光学性能。(c) 2006年美国光学学会。
In this study, titanium dioxide (TiO2) films were fabricated by cosputtering of a titanium (Ti) target and an aluminum (Al) slice in a smaller area by an ion-beam sputtering deposition method. The sputtered films were postannealed at 450 degrees C. The x-ray photoelectron spectroscopy spectra were categorized by their oxygen bonding variations, which include high-binding-energy oxygen, (HBO), bridging oxygen, low-binding-energy oxygen, and shifts of the binding energies (BEs) of oxygen (O) and Ti signals. The enhancement of HBO and higher BE shifts of the O 1s spectra as a function of cosputtered Al in the film imply the formation of an Al-O-Ti linkage. Corresponding changes in the Ti 2p spectra further confirm the modification of properties of the cosputtered film that results from the variation of the chemical bonding environment. An observed correlation between the chemical structure and optical absorption of the Al cosputtered films can be used to modify the optical properties of the film. (c) 2006 Optical Society of America.