Study of the dynamics of point defects at Si(111)-7×7 surfaces with scanning tunneling microscopy
Study of the dynamics of point defects at Si(111)-7×7 surfaces with scanning tunneling microscopy
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用扫描隧道显微镜研究Si(111)-7×7表面点缺陷的动力学
DOI:
10.1116/1.581393
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发表时间:
1998
期刊:
影响因子:
--
通讯作者:
T. Tsong
中科院分区:
文献类型:
--
作者:
I. Hwang;R. Lo;T. Tsong
With a high-temperature scanning tunneling microscope, we study several kinds of point defects at Si(111)-7×7 surfaces. A special type of defect, which we call pseudo-vacancy, appears dark in both tunneling polarities. They are not real vacancies, and they are neither caused by reaction of silicon surface atoms with residual gases, nor due to dopants coming from the Si substrates. On Si(111)-7×7, we can create single vacancies or vacancy clusters at elevated temperatures, which are found to be filled up after a period of time. In addition, we study defects caused by adsorption of O2, CH4, C2H4, and H on clean Si(111)-7×7 surfaces from room temperature to some elevated temperatures. The species produced for adsorption at elevated temperatures are often different from those for adsorption at room temperature. Also, we can observe interesting dynamic behavior, such as site hopping and desorption, at high temperatures. In this work, we find that different surface defects exhibit very different dynamic behavio...