Generation of Integrated Atmospheric-Pressure Microplasmas
Generation of Integrated Atmospheric-Pressure Microplasmas
复制标题
集成大气压微等离子体的产生
DOI：
10.1143/jjap.42.6584
复制
发表时间：
2003
影响因子：
1.5
通讯作者：
Y. Horiike
中科院分区：
文献类型：
--
作者：
Kazutake Taniguchi;T. Fukasawa;H. Yoshiki;Y. Horiike
这项工作是基于这样的动机，即通过对限制在小体积内的微等离子体进行积分，可以开发出大面积高密度等离子体源。首先，利用电容耦合等离子体(CCP)和电感耦合等离子体(ICP型)在单个小直径陶瓷管中通过电极产生了氦气微等离子体。然后，基于所获得的特性，讨论了二维和三维集成管的维持电压和射频功率的变化。然而，从高度集成的ICP型中心周围的微弱放电中可以注意到CCP分量的存在。因此，我们还利用窄梳状电极研究了平面型等离子体的产生，这使得我们能够在更低的电压下产生符合帕森定律的放电。结果，在12 mm×12 mm的面积内成功地产生了均匀的等离子体。利用平面型等离子体在低维持电压下实现了常压微等离子体产生纯氮气和氦气。
This work is based on the motivation that by integrating microplasmas confined in a small volume, a large area high-density plasma source could be developed. Firstly, He gas microplasmas were generated by capacitively coupled plasma (CCP) and inductively coupled type plasma (ICP-type) in single small diameter ceramic tubes supplied with 13.56 MHz power via electrodes. Then, based upon the obtained characteristics, sustaining voltage and RF power variations were discussed for integrating tubes two and three dimensionally. However, the presence of the CCP component was noticed from the weak discharge around the center of the highly integrated ICP-type. Therefore, the generation of planar-type plasma was also studied using narrow comb electrodes, which enabled us to produce the discharge at a lower voltage in accordance with Paschen's law. As a result, uniform plasma was successfully generated in an area of 12 mm×12 mm. Atmospheric-pressure microplasma generation of pure N2 gas as well as He gas was realized by planar type plasma at low sustaining voltages.