Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon films
Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon films
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用于非晶碳膜化学气相沉积的甲烷等离子体的诊断和建模
DOI：
10.1088/0022-3727/17/8/026
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发表时间：
1984
期刊：
影响因子：
--
通讯作者：
Y. Urano
中科院分区：
文献类型：
--
作者：
K. Tachibana;M. Nishida;H. Harima;Y. Urano
在射频放电的甲烷等离子体中，使用激光吸收技术测量了CH4与电子碰撞时的解离率。测量速率随射频功率的增加和气体压力的降低而增加。用电热探针测量了电子能量分布函数f（epsilon）和电子密度ne。测得的f（）与麦克斯韦分布很不相同，而与德鲁伊维斯泰尼分布很接近。由f（epsilon）推导出的解离速率常数和报告的横截面乘以测量的ne与激光吸收法的结果一致。在这些测量的基础上，利用一组CH4和等离子体中产生的各种中性和离子的速率方程，对等离子体进行了建模。计算得到的血浆中CH4的解离度与实测结果吻合较好。模型预测等离子体中最丰富的中性自由基是CH3，而CH5+是最丰富的离子种类。
In an RF-discharge methane plasma, the dissociation rate of CH4 in collisions with electrons has been measured using a laser absorption technique. The measured rate increases as the RF power increases and as the gas pressure decreases. The electron energy distribution function f( epsilon ) and the electron density ne have also been measured by a heated electrical probe. The measured f( epsilon ) is quite different from the Maxwellian distribution and rather close to the Druyvesteynian distribution. The dissociation rate constant deduced from f( epsilon ) and the reported cross-section when multiplied by the measured ne is consistent with the results of the laser absorption method. Based on these measurements a modelling of the plasma has been performed using a set of rate equations for CH4 and the various neutral and ionic species produced in the plasma. The calculated degree of dissociation for CH4 in the plasma agrees well with the measured results. The most abundant neutral radical in the plasma predicted by the model is CH3, while CH5+ is the most abundant ionic species.