Activation characterization of a novel quinary alloy Ti–Zr–V–Hf–Nb non-evaporable getters by x-ray photoelectron spectroscopy
Activation characterization of a novel quinary alloy Ti–Zr–V–Hf–Nb non-evaporable getters by x-ray photoelectron spectroscopy
复制标题
X射线光电子能谱表征新型五元合金Ti-Zr-V-Hf-Nb非蒸发型吸气剂的活化
DOI：
10.1063/5.0079537
复制
发表时间：
2022
影响因子：
1.6
通讯作者：
Aijun Mi
中科院分区：
文献类型：
--
作者：
Jie Wang;Yong Gao;Yaocheng Hu;Jing Zhang;Zhiming You;Qiuyu Sun;Qingyu Si;Zhanglian Xu;Sheng Wang;Guoming Liu;Aijun Mi
首次研究了铜基新型五元合金Ti-Zr-V-Hf-Nb非蒸散吸气剂（NEG）薄膜涂层的活化过程和机理。通过使用DC溅射方法在铜基底上沉积约1.075 μm的Ti-Zr-V-Hf-Nb NEG膜涂层。分别在100、150和180 °C下活化2小时的NEG通过X射线光电子能谱（XPS）原位表征。沉积态的NEG膜主要由高价态金属氧化物和低价态金属氧化物以及少量金属组成。原位XPS研究表明，当活化温度从100 ° C升高到180 °C时，Ti、Zr、V、Hf和Nb的高氧化态含量逐渐降低，低价金属氧化物和金属态含量逐步增加。这一结果表明，这种新型的五元合金Ti-Zr-V-Hf-Nb NEG薄膜涂层可以被活化并用于产生超高真空。
The first results on the activation process and mechanisms of novel quinary alloy Ti-Zr-V-Hf-Nb non-evaporable getter (NEG) film coatings with copper substrates were presented. About 1.075 µm of Ti-Zr-V-Hf-Nb NEG film coating was deposited on the copper substrates by using the DC sputtering method. The NEG activation at 100, 150, and 180 °C, respectively, for 2 h was in situ characterized by x-ray photoelectron spectroscopy (XPS). The as-deposited NEG film mainly comprised the high valence state metallic oxides and the sub-oxides, as well as a small number of metals. The in situ XPS studies indicated that the concentrations of the high-oxidized states of Ti, Zr, V, Hf, and Nb gradually decreased and that of the lower valence metallic oxides and metallic states increased in steps, when the activation temperature increased from 100 to 180 °C. This outcome manifested that these novel quinary alloy Ti-Zr-V-Hf-Nb NEG film coatings could be activated and used for producing ultra-high vacuum.