New methodologies for measuring film thickness, coverage, and topography
New methodologies for measuring film thickness, coverage, and topography
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测量薄膜厚度、覆盖率和形貌的新方法
DOI：
10.1109/20.824434
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发表时间：
2000
期刊：
影响因子：
--
通讯作者：
J. Frommer
中科院分区：
文献类型：
--
作者：
C. M. Mate;B. Yen;D. Miller;M. Toney;M. Scarpulla;J. Frommer
我们描述了如何X射线反射率（XRR），电子能谱化学分析（ESCA），原子力显微镜（AFM）的技术可以用来获得的结构参数，厚度，覆盖率和形貌的薄膜上使用的磁记录磁盘。我们专注于磁盘上的超薄无定形氮化碳（CNx）涂层。每种技术都有自己的优势：XRR绝对测量薄膜厚度，ESCA确定薄膜的化学成分，AFM精确绘制形貌。对于所研究的CNx外涂层，我们发现厚度小于20 /spl Aring/的不完全覆盖，并且我们发现具有rms粗糙度/spl les/11 /spl Aring/的小表面粗糙度。
We describe how the techniques of X-ray reflectivity (XRR), electron spectroscopy for chemical analysis (ESCA), and atomic force microscopy (AFM) can be used to obtain the structural parameters-thickness, coverage, and topography-of thin films used on magnetic recording disks. We focus on ultra-thin amorphous nitrogenated carbon (CNx) overcoats on disks. Each technique has its own strengths: XRR measures film thickness absolutely, ESCA determines the chemical composition of the films, and AFM maps topography accurately. For the CNx overcoats investigated, we find incomplete coverage for thicknesses less than 20 /spl Aring/, and we find a small surface roughness with rms roughness /spl les/11 /spl Aring/.