Characterization of TiNi shape-memory alloy thin films for MEMS applications
Characterization of TiNi shape-memory alloy thin films for MEMS applications
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DOI：
10.1016/s0257-8972(01)01324-x
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发表时间：
2001-08-01
影响因子：
5.4
通讯作者：
Gao, XY
中科院分区：
文献类型：
--
作者：
Fu, YQ;Huang, WM;Gao, XY
薄膜形状记忆合金（SMA）在微机电系统（MEMS）应用领域中被认为是一种很有前途的高性能材料。本文研究了溅射沉积TiNi薄膜的化学成分、显微结构和相变行为。用原子力显微镜（AFM）和扫描电子显微镜（SEW）对镀层的表面和横截面形貌进行了分析。差示扫描量热仪（DSC）的结果清楚地显示了加热和冷却时的马氏体相变。X射线衍射分析（XRD）也揭示了晶体结构随温度的变化。通过在体硅微机械悬臂梁结构上沉积TiNi薄膜，获得了具有良好形状记忆效应的微梁。有限元模拟结果的微梁变形（使用测量的NiTi薄膜参数）与测量行为吻合得很好。(C)2001 Elsevier Science B.V.保留所有权利。
Thin film shape-memory alloys (SMAs) have been recognized as promising and high performance materials in the field of microelectromechanical systems (MEMS) applications. In this investigation, chemical composition, microstructure and phase transformation behaviors of sputter deposited TiNi films were studied. The surface and cross-section morphology of the deposited coating was analyzed using atomic force microscopy (AFM) and scanning election microscopy (SEW The results from the differential scanning calorimeter (DSC) showed clearly the martensitic transformation upon heating and cooling. X-Ray diffraction analysis (XRD) also revealed the crystalline structure changing with temperature. By depositing TiNi films on the bulk micromachined Si cantilever structures, micro-beams exhibiting a good shape-memory effect were obtained. Finite element simulation results of the deformation of micro-beam (using the measured NiTi thin film parameters) agree quite well with the measured behavior. (C) 2001 Elsevier Science B.V. All rights reserved.