Directed assembly of asymmetric ternary block copolymer-homopolymer blends using symmetric block copolymer into checkerboard trimming chemical pattern
Directed assembly of asymmetric ternary block copolymer-homopolymer blends using symmetric block copolymer into checkerboard trimming chemical pattern
复制标题
DOI：
10.1116/1.3013336
复制
发表时间：
2008-12
影响因子：
1.4
通讯作者：
Huiman Kang;G. S. W. Craig;P. Nealey
中科院分区：
文献类型：
--
作者：
Huiman Kang;G. S. W. Craig;P. Nealey
在这里，作者研究了由聚苯乙烯-嵌段-聚甲基丙烯酸甲酯共聚物（PS-b-PMMA）和相应的 PS 和 PMMA 均聚物组成的不对称三元共混物在电子束光刻制造的棋盘化学图案上的定向组装，控制暴露线或虚线的周期（LS）、长度（D）和间距 在化学模式中。棋盘化学图案不能用典型的自组装嵌段共聚物形态生成，由偏移线、平行线、虚线或交替线和虚线组成，并且用于动态随机存取存储器的制造。复杂图案上组装的嵌段共聚物薄膜的完美程度和域均匀性是共混物中 PS 的体积分数 (ψS) 与 PS 润湿的图案面积分数 (FS) 以及共混物中均聚物的体积分数 (ψH) 的可通约性的函数。最好的组装...
Here, the authors studied the directed assembly of the asymmetric ternary blends, composed of polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) and the corresponding PS and PMMA homopolymers, on a checkerboard chemical pattern which was fabricated by e-beam lithography, controlling the periodicity (LS), length (D), and spacing of the exposed lines or dashed lines in the chemical pattern. The checkerboard chemical pattern, which cannot be generated with typical self-assembled block copolymer morphologies, consists of either offset, parallel, dashed lines, or alternating lines and dashed lines, and is used in the fabrication of dynamic random access memory. The degree of perfection and domain uniformity of the assembled block copolymer thin films on the complex pattern were a function of the commensurability of the volume fraction of PS in the blend (ϕS) with the fraction of area on the pattern wet by PS (FS), as well as the volume fraction of homopolymer in the blend (ϕH). The best assembly...