The angular dependence of the planar Hall effect in Co-Ni films
The angular dependence of the planar Hall effect in Co-Ni films
复制标题
Co-Ni 薄膜中平面霍尔效应的角度依赖性
DOI:
10.1063/1.368145
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发表时间:
1998
影响因子:
3.2
通讯作者:
J. C. Lee
中科院分区:
文献类型:
--
作者:
S. Jen;K. P. Huang;J. C. Lee
Co100−xNix (x=70, 75, 80, 90 at. % Ni) alloy films were made by the vapor deposition method. An easy axis could be defined by a deposition field parallel to either the length (L film) or width (T film) of the sample. The anisotropic magnetoresistance (AMR) and the planar Hall effect (PHE) hysteresis loops were simultaneously measured with a slowly sweeping field H. The angle θ between the hard axis and H could be varied. Domain patterns were also recorded at each stage of the magnetization or demagnetization process. Besides the usual AMR and PHE behaviors, we have observed the forms of a voltage “mountain,” like ΔVmr and ΔVph, superimposed on the normal curves at the switching field Hsw. ΔVmr is an even function of θ and ΔVph is an odd function. The well known magneto-transport theory based on the single-domain model is modified to adopt the real situation of the multidomain structure. We have been successful in explaining all the ΔVph data observed experimentally. In addition, from the angular dependenc...