Work function dependence of surface produced H− in the presence of a plasma
Work function dependence of surface produced H− in the presence of a plasma
复制标题
在等离子体存在下，表面产生的 H− 的功函数依赖性
DOI：
10.1063/1.34424
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发表时间：
2008
影响因子：
2.3
通讯作者：
J. W. Stearns
中科院分区：
文献类型：
--
作者：
M. Wada;R. Pyle;J. W. Stearns
来自负偏置“转换器阴极”的最大H−通量出现在功函数最小值处。铯化的氢等离子体在转换器处产生部分铯化的表面。铯覆盖率可以通过铯分压控制，转换器表面的偏压通过光电效应测量，使用明亮的光源和一系列滤光片。通过旋转转换器来测量角度依赖性。
The maximum H− flux from a negatively biased ‘‘converter cathode’’ occurs at the work function minimum. A cesiated hydrogen plasma produces a partially‐cesiated surface at the converter. The cesium coverage can be controlled by the cesium partial pressure, the bias on the converter surface is measured by the photo‐electric effect, using a bright light source and a series of fliters. The angular dependence is measured by rotating the converter.