Uncooled microbolometer detector: recent developments at ULIS
Uncooled microbolometer detector: recent developments at ULIS
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非制冷微测辐射热计探测器：ULIS 的最新进展
DOI：
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发表时间：
2005
期刊：
影响因子：
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通讯作者：
O. Legras
中科院分区：
文献类型：
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作者：
J. Tissot;C. Trouilleau;B. Fièque;A. Crastes;O. Legras
非制冷红外焦平面阵列正被开发用于广泛的热成像应用。消防，预测性维护，过程控制和热成像是可以从非制冷红外探测器中受益的一些工业应用。因此，为了满足这些市场，开发了一种35 μm像素间距的非制冷红外探测器技术，可以生产高性能的160×120和384×288阵列。此外，还开发了非制冷320×240/45 μm阵列的宽带版本，以解决过程控制和更精确的工业炉控制问题。ULIS非晶硅技术非常适合于大规模生产低成本探测器。在简要介绍微测辐射热计技术背景的基础上，介绍了35 μm像素间距探测器的性能和45 μm像素间距的320×240宽波段红外焦平面阵列。
Uncooled infrared focal plane arrays are being developed for a wide range of thermal imaging applications. Fire-fighting, predictive maintenance, process control and thermography are a few of the industrial applications which could take benefit from uncooled infrared detector. Therefore, to answer these markets, a 35-μm pixel-pitch uncooled IR detector technology has been developed enabling high performance 160×120 and 384×288 arrays production. Besides a wide-band version from uncooled 320×240/45 μm array has been also developed in order to address process control and more precisely industrial furnaces control. The ULIS amorphous silicon technology is well adapted to manufacture low cost detector in mass production. After some brief microbolometer technological background, we present the characterization of 35 μm pixel-pitch detector as well as the wide-band 320×240 infrared focal plane arrays with a pixel pitch of 45 μm.