Synthesis of Polymers with a Norbornane-backbone by Radical Copolymerization of Alkyl 2-Norbornene-2-carboxylates for Photoresist Applications
Synthesis of Polymers with a Norbornane-backbone by Radical Copolymerization of Alkyl 2-Norbornene-2-carboxylates for Photoresist Applications
复制标题
通过 2-降冰片烯-2-羧酸烷基酯自由基共聚合成具有降冰片烷主链的聚合物，用于光刻胶应用
DOI：
10.1038/pj.2012.180
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
Eiji Ihara
中科院分区：
文献类型：
--
作者：
Yamaguchi;H.;Yo Nakamura;Eiji Ihara
本文描述了2-异冰片烯-2-羧酸烷基酯1a-c与（甲基）丙烯酸烷基酯的自由基共聚，以制备主链中具有异冰片烷的共聚物。合成了含γ-丁内酯和羟基的双烯单体（1b和1c），研究了它们与丙烯酸正丁酯的自由基共聚合行为。甲基2-环己烯-2-羧酸酯，1a，和新的单体，1b和1c，被用作自由基三元共聚单体与内酯和金刚烷含有（甲基）丙烯酸酯，以产生共聚物，可以作为新的，更强大的化学193纳米光刻胶材料。在标准条件下，在碱性水溶液中，对于各种曝光剂量的193 nm ArF激光，测量旋涂共聚物膜在暴露于光酸产生剂（光致抗蚀剂应用中的重要特性）之后的溶解速率。
The radical copolymerization of alkyl 2-norbornene-2-carboxylates, 1a–c, with alkyl (meth) acrylates, to produce copolymers with norbornane in the main chain, is described here. γ-Butyrolactone-and hydroxy group-containing norbornene-based monomers (1b and 1c, respectively) were freshly synthesized, and their radical copolymerization behavior with n-butyl acrylate was examined. Methyl 2-norbornene-2-carboxylate, 1a, and the new monomers, 1b and 1c, were employed as comonomers for radical terpolymerization with lactone-and adamantane-containing (meth) acrylates to produce copolymers that could be applied as new, more chemically robust 193-nm photoresist materials. The dissolution rate of the spin-coated copolymer films after exposure to a photoacid generator, a significant characteristic in the photoresist application, was measured for various exposure doses of 193-nm ArF laser light under standard conditions in an aqueous alkaline solution.