Interaction of a $\hbox{CO}_{2}$ Laser Pulse With Tin-Based Plasma for an Extreme Ultraviolet Lithography Source
Interaction of a $\hbox{CO}_{2}$ Laser Pulse With Tin-Based Plasma for an Extreme Ultraviolet Lithography Source
复制标题
$hbox{CO}_{2}$ 激光脉冲与锡基等离子体的相互作用，用于极紫外光刻源
DOI：
10.1109/tps.2009.2034379
复制
发表时间：
2010
影响因子：
1.5
通讯作者：
F. Najmabadi
中科院分区：
文献类型：
--
作者：
Y. Tao;M. Tillack;S. Yuspeh;R. Burdt;N. Shaikh;N. Amin;F. Najmabadi
研究了用于13.5 nm极紫外光刻源的CO2激光脉冲与锡基等离子体的相互作用。结果表明，波长为10.6？m的CO_2激光器比波长为1.06？m的Nd：YAG激光器对表面杂质更敏感。这表明，二氧化碳激光更有可能被目标表面附近较薄的层吸收。与Nd：YAG激光器相比，CO2激光器对固体锡靶具有更高的带内(2%带宽)转换效率(CE)，这是因为等离子体对EUV发射的重吸收较少。然而，对于含低浓度锡的泡沫靶，带内CE低于含固体锡的泡沫靶。通过等离子体约束可以增强CE。这些结果表明，波长在1.06到10.6m之间的驱动激光可能是从激光到13.5 nm EUV发射产生更高CE的更好的选择。
The interaction of a CO2 laser pulse with Sn-based plasma for a 13.5-nm extreme ultraviolet (EUV) lithography source was investigated. It was noted that a CO2 laser with wavelength of 10.6 ¿m is more sensitive to surface impurities as compared with a Nd:YAG laser with wavelength of 1.06 ¿m . This reveals that a CO2 laser is more likely absorbed in a thinner layer near the target surface. Compared with a Nd:YAG laser, a CO2 laser shows higher in-band (2% bandwidth) conversion efficiency (CE) with a solid Sn target due to less reabsorption of the EUV emission induced by the plasma. However, with foam targets containing low concentrations of Sn, the in-band CE is lower than that with solid Sn. The CE can be enhanced with plasma confinement. These results suggest that a driving laser with wavelength between 1.06 and 10.6 ¿m may be an even better choice to generate higher CE from laser to 13.5-nm EUV emission.
影响因子：
2.2
作者：
Nishihara, Katsunobu;Sunahara, Atsushi;Mima, Kunoki
通讯作者：
Mima, Kunoki