Formation of nanostructured metallic glass thin films upon sputtering.
Formation of nanostructured metallic glass thin films upon sputtering.
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DOI：
10.1016/j.heliyon.2016.e00228
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发表时间：
2017-01
期刊：
影响因子：
4
通讯作者：
Louzguine-Luzgin DV
中科院分区：
文献类型：
--
作者：
Ketov SV;Joksimovic R;Xie G;Trifonov A;Kurihara K;Louzguine-Luzgin DV
研究了射频磁控溅射法制备的多元金属玻璃薄膜的形貌演化。金属玻璃溅射有两种模式：平滑膜模式和成簇膜模式。确定了对溅射模式影响最大的溅射参数。结果表明，在石英浮法玻璃和硅基片上沉积出表面光滑、具有纳米玻璃结构的非晶态Ni-Nb薄膜。目标的相组成似乎对沉积的非晶薄膜的化学组成有显着的影响。还确定了光滑和纳米玻璃状Ni-Nb膜之间的电荷传输和纳米力学性能的差异。
Morphology evolution of the multicomponent metallic glass film obtained by radio frequency (RF) magnetron sputtering was investigated in the present work. Two modes of metallic glass sputtering were distinguished: smooth film mode and clustered film mode. The sputtering parameters, which have the most influence on the sputtering modes, were determined. As a result, amorphous Ni-Nb thin films with a smooth surface and nanoglassy structure were deposited on silica float glass and Si substrates. The phase composition of the target appeared to have a significant influence on the chemical composition of the deposited amorphous thin film. The differences in charge transport and nanomechanical properties between the smooth and nanoglassy Ni-Nb film were also determined.