An image analysis method for quantifying precision and disorder in nanofabricated photonic structures
An image analysis method for quantifying precision and disorder in nanofabricated photonic structures
复制标题
一种量化纳米制造光子结构精度和无序度的图像分析方法
DOI：
10.1088/1361-6528/ac99e7
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发表时间：
2022
期刊：
影响因子：
3.5
通讯作者：
Doty, Matthew F
中科院分区：
文献类型：
--
作者：
Carfagno, Henry;Garcia, Pedro David;Doty, Matthew F
无序是光子系统和器件中的一个重要参数，影响拓扑光子态的鲁棒性和波导中模式的安德森局域化等现象。我们开发并演示了一种分析和可视化周期性结构（如光子晶体）中位置、尺寸和形状紊乱的方法。该分析方法对障碍类型的选择性和对障碍的敏感性均小于1%。我们证明该方法可以应用于更复杂的形状，如拓扑光子学中使用的形状。该方法为工艺开发和质量控制提供了有力的工具，包括在图案转移前分析电子束光刻的精度；量化光刻、沉积或蚀刻工艺的精度限制；并研究在其他周期性阵列中单个对象的有意位移。
Disorder is an essential parameter in photonic systems and devices, influencing phenomena such as the robustness of topological photonic states and the Anderson localization of modes in waveguides. We develop and demonstrate a method for both analyzing and visualizing positional, size, and shape disorder in periodic structures such as photonic crystals. This analysis method shows selectivity for disorder type and sensitivity to disorder down to less than 1%. We show that the method can be applied to more complex shapes such as those used in topological photonics. The method provides a powerful tool for process development and quality control, including analyzing the precision of E-beam lithography before patterns are transferred; quantifying the precision limits of lithography, deposition, or etch processes; and studying the intentional displacement of individual objects within otherwise periodic arrays.
影响因子：
1.4
作者：
Le Thomas, N.;Diao, Z.;Houdre, R.
通讯作者：
Houdre, R.
影响因子：
8.6
作者：
Arregui, Guillermo;Gomis-Bresco, Jordi;David Garcia, Pedro
通讯作者：
David Garcia, Pedro