Wavelength Dependence of the Laser-Excitation Process on a Silicon Surface
Wavelength Dependence of the Laser-Excitation Process on a Silicon Surface
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硅表面激光激发过程的波长依赖性
DOI:
10.1103/physrevapplied.13.024062
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发表时间:
2020
影响因子:
4.6
通讯作者:
Otobe T.
中科院分区:
文献类型:
--
作者:
Otobe T.