Novel electrostatic repulsion forces in MEMS applications by nonvolatile charge injection
Novel electrostatic repulsion forces in MEMS applications by nonvolatile charge injection
复制标题
通过非易失性电荷注入实现 MEMS 应用中的新型静电斥力
DOI：
10.1109/memsys.2002.984342
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
E. Kan
中科院分区：
文献类型：
--
作者：
Zengtao Liu;Myongseob Kim;N. Shen;E. Kan
本文首次通过非挥发性电荷注入，证明了两束隔离梁之间的静电斥力是MEMS应用中可行的驱动机制。已经制造了集成MEMS梁和EEPROM结构的器件，并且在长度为360 /spl mu/m的梁的3 /spl mu/m间隙中记录了/spl sim/0.2 /spl mu/N的致动力。通过更小的间隙可以获得更大的致动力。提出了一种电容网络模型来分析这类系统。该方案有望补充有吸引力的静电驱动，并在实现无磨损微型轴承，铰链和涡轮机方面找到有价值的应用。
This paper demonstrates, for the first time, electrostatic repulsion forces between two isolating beams as a viable actuation mechanism in MEMS applications by nonvolatile charge injection. Devices integrating MEMS beams and EEPROM structures have been fabricated and an actuation force of /spl sim/0.2 /spl mu/N has been recorded across a 3 /spl mu/m gap for beams 360 /spl mu/m in length. Larger actuation forces can be achieved through smaller gaps. A capacitor-network model is presented for analyzing such systems. This scheme holds promises in complimenting attractive electrostatic actuation and also finds valuable applications in achieving wear-free micro-bearings, hinges and turbines.