Refractive Index Memory Effect of Ferroelectric Materials Induced by Electrical Imprint Field

Refractive Index Memory Effect of Ferroelectric Materials Induced by Electrical Imprint Field
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电压印场引起的铁电材料的折射率记忆效应

DOI:
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发表时间:
2008
期刊:
Japanese Journal of Applied Physics 47
影响因子:
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通讯作者:
Hiroshi Hosaka and Takeshi Morita
Hiroshi Hosaka and Takeshi Morita
中科院分区:
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文献类型:
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作者:
Toshinori Ohashi;Hiroshi Hosaka and Takeshi Morita

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