Interaction Between Conduction-band Edge and Nitrogen-related Localized Levels in Nitrogen δ-doped GaAs

Interaction Between Conduction-band Edge and Nitrogen-related Localized Levels in Nitrogen δ-doped GaAs
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氮 δ 掺杂 GaAs 导带边缘与氮相关局域能级之间的相互作用

DOI:
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发表时间:
2011
期刊:
Physica Status Solidi C
影响因子:
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通讯作者:
O.Wada
O.Wada
中科院分区:
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文献类型:
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作者:
Y.Harada;O.Kojima;T.Kita;O.Wada

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