Effect of sputtering target power density on topography and residual stress during growth of nanocomposite nc-TiN/a-SiNx thin films
Effect of sputtering target power density on topography and residual stress during growth of nanocomposite nc-TiN/a-SiNx thin films
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DOI：
10.1016/j.diamond.2004.03.008
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发表时间：
2004-10
影响因子：
4.1
通讯作者：
Sam Zhang;Deen Sun;Y. Fu;H. Du;Qing Zhang
中科院分区：
文献类型：
--
作者：
Sam Zhang;Deen Sun;Y. Fu;H. Du;Qing Zhang
