Development of Electron Beam Ion Source for Nanoprocesses II
Development of Electron Beam Ion Source for Nanoprocesses II
复制标题
纳米过程电子束离子源的开发 II
DOI：
10.3131/jvsj.48.317
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发表时间：
2005
期刊：
影响因子：
--
通讯作者：
S. Mashiko
中科院分区：
文献类型：
--
作者：
M. Sakurai;H. Sakaue;H. Watanabe;N. Nakamura;S. Ohtani;Y. Kawase;K. Mitsumori;T. Terui;S. Mashiko
一种用于使用高电荷离子进行纳米加工的新型电子束离子源被研发出来。该离子源的设计是基于电子和离子在离子源中运动轨迹的计算，以优化离子产生和引出的效率。使用由闭循环制冷机冷却的商用超导磁体（亥姆霍兹线圈，3特斯拉）来降低运行成本。独立的真空室设计使得离子源中的电极能够在250°C下烘烤，通过移除磁体室而无需放气即可实现超高真空条件。
A novel electron beam ion source was developed for nanoprocesses using highly charged ions. The ion source was designed to optimize the efficiency of ion production and extraction based on the trajectory calculations of electrons and ions traveling through the ion source. A commercial super-conducting magnet (Helmholz coils, 3 T) cooled by a closed-cycle refrigerator is used to reduce the operating costs. The separate vacuum chambers design enables 250°C baking of electrodes in the ion source to realize ultrahigh vacuum condition by removing the magnet chamber without venting.