Novel sub-100 nm surface chemical modification by optical near-field induced photocatalytic reaction
Novel sub-100 nm surface chemical modification by optical near-field induced photocatalytic reaction
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DOI：
10.1007/s10404-014-1361-7
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发表时间：
2014-02
影响因子：
2.8
通讯作者：
T. Le;K. Mawatari;Y. Pihosh;T. Kawazoe;T. Yatsui;M. Ohtsu;T. Kitamori
中科院分区：
文献类型：
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作者：
T. Le;K. Mawatari;Y. Pihosh;T. Kawazoe;T. Yatsui;M. Ohtsu;T. Kitamori
表面修饰对于促进微纳流体器件的新功能应用是必不可少的。在迄今为止开发的许多修饰技术中，光诱导化学修饰在稳健性、工艺简单性和化学功能的可行性方面是最通用的方法。该方法尤其适用于封闭空间，例如后粘合器件。然而，光学衍射极限的限制仍然是将图案尺寸缩小到纳米级的一个具有挑战性的问题。在这里，我们展示了利用光催化剂 (TiO2) 纳米结构上产生的新型光学近场 (ONF) 进行亚 100 nm 尺度的新型表面改性。使用可见光源 (488 nm) 和传统的照射装置实现了 40 nm 的最小图案尺寸，远小于衍射极限。光强度对图案尺寸的可控性、功能的可行性以及非接触式工作模式对键合后微纳流体器件的表面图案产生影响。值得注意的是，我们的结果首次验证了非金属材料纳米结构上的ONF及其在纳米尺度上操纵化学反应的能力。
The surface modification is indispensable to facilitate new functional applications of micro/nanofluidics devices. Among many modification techniques developed so far, the photo-induced chemical modification is the most versatile method in terms of robustness, process simplicity, and feasibility of chemical functionality. In particular, the method is useful for closed spaces, such as post-bonded devices. However, the limitation by optical diffraction limit is still a challenging issue in scaling down the pattern sizes to nanoscale. Here, we demonstrated a novel surface modification on sub-100 nm scale utilizing the novel optical near-field (ONF) generated on nanostructures of photocatalyst (TiO2). The minimum pattern size of 40 nm, which was much smaller than diffraction limit, was achieved using a visible light source (488 nm) and a conventional irradiation setup. The controllability of pattern size by light intensity, the feasibility of functionality, and the non-contact working mode have impacts on surface patterning of post-bonded micro/nanofluidics devices. It is also worthy to note that our results verified for the first time the ONF on nanostructures of non-metal materials and its ability to manipulate the chemical reaction on nanoscale.