Effects of Externally Applied Magnetic Perturbation in a Spherical Tokamak Plasma Produced by ECH on the LATE Device

Effects of Externally Applied Magnetic Perturbation in a Spherical Tokamak Plasma Produced by ECH on the LATE Device
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外部磁扰动对 ECH 在 LATE 装置上产生的球形托卡马克等离子体的影响

DOI:
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发表时间:
2011
期刊:
Proc.38th EPS conference on Plasma Physics
影响因子:
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通讯作者:
T.Maekawa
T.Maekawa
中科院分区:
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文献类型:
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作者:
F.Watanabe;M.Uchida;H.Tanaka;T.Maekawa

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